Long-lasting hydrophilicity on nanostructured Si-incorporated diamond-like carbon films

We investigated the long-lasting hydrophilic behavior of a Si-incorporated diamond-like carbon (Si-DLC) film by varying the Si fraction in DLC matrix through oxygen and nitrogen plasma surface treatments. The wetting behavior of the water droplets on the pure DLC and Si-DLC with the nitrogen or oxyg...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 26(2010), 22 vom: 16. Nov., Seite 17203-9
1. Verfasser: Yi, Jin Woo (VerfasserIn)
Weitere Verfasser: Moon, Myoung-Woon, Ahmed, Sk Faruque, Kim, Haeri, Cha, Tae-Gon, Kim, Ho-Young, Kim, Seock-Sam, Lee, Kwang-Ryeol
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2010
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Plasma Gases Water 059QF0KO0R Diamond 7782-40-3 Oxygen S88TT14065 Silicon Z4152N8IUI
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520 |a We investigated the long-lasting hydrophilic behavior of a Si-incorporated diamond-like carbon (Si-DLC) film by varying the Si fraction in DLC matrix through oxygen and nitrogen plasma surface treatments. The wetting behavior of the water droplets on the pure DLC and Si-DLC with the nitrogen or oxygen plasma treatment revealed that the Si element in the oxygen-plasma-treated Si-DLC films played a major role in maintaining a hydrophilic wetting angle of <10° for 20 days in ambient air. The nanostructured patterns with a roughness of ∼10 nm evolved because of the selective etching of the carbon matrix by the oxygen plasma in the Si-DLC film, where the chemical component of the Si-Ox bond was enriched on the top of the nanopatterns and remained for over 20 days 
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700 1 |a Moon, Myoung-Woon  |e verfasserin  |4 aut 
700 1 |a Ahmed, Sk Faruque  |e verfasserin  |4 aut 
700 1 |a Kim, Haeri  |e verfasserin  |4 aut 
700 1 |a Cha, Tae-Gon  |e verfasserin  |4 aut 
700 1 |a Kim, Ho-Young  |e verfasserin  |4 aut 
700 1 |a Kim, Seock-Sam  |e verfasserin  |4 aut 
700 1 |a Lee, Kwang-Ryeol  |e verfasserin  |4 aut 
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