Two-dimensional self-assemblies of silica nanoparticles formed using the "bubble deposition technique"
Two-dimensional silica nanoparticle assemblies were obtained by deposition of bubble made from a surfactant solution containing nanoparticles onto hydrophobic silicon substrate. The morphologies of the nanoparticle assemblies can be finely controlled by several experimental parameters, including sur...
Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 26(2010), 22 vom: 16. Nov., Seite 16828-32 |
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Weitere Verfasser: | , , |
Format: | Online-Aufsatz |
Sprache: | English |
Veröffentlicht: |
2010
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Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
Schlagworte: | Journal Article Research Support, Non-U.S. Gov't Organosilicon Compounds Silicon Dioxide 7631-86-9 hexamethylsilazane H36C68P1BH |
Zusammenfassung: | Two-dimensional silica nanoparticle assemblies were obtained by deposition of bubble made from a surfactant solution containing nanoparticles onto hydrophobic silicon substrate. The morphologies of the nanoparticle assemblies can be finely controlled by several experimental parameters, including surfactant concentration, nanoparticle concentration, and deposition time. Monolayer of nanoparticles with surface coverage of about 100% can be obtained under appropriate conditions. The method can also be applied to another hydrophobic substrate, HMDS (hexamethyldisilazane)-modified silicon substrate. Furthermore, it can be applied directly to lithography patterned substrates, meaning a high compatibility with the well-developed conventional top-down approaches to nanodevices. This bubble deposition technique is expected to be a promising method in the field of nano-object assembly and organization and has great application potentials |
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Beschreibung: | Date Completed 04.03.2011 Date Revised 15.11.2012 published: Print-Electronic Citation Status MEDLINE |
ISSN: | 1520-5827 |
DOI: | 10.1021/la102894c |