Photocurable silsesquioxane-based formulations as versatile resins for nanoimprint lithography
Methacrylate octafunctionalized silsesquioxane (SSQMA) was shown to be an ideal material with high performance for ultraviolet (UV)-based nanoimprint lithography (NIL). The total viscosity of SSQMA-based formulations was adjusted to between 0.8 and 50 cP by incorporating low-viscosity acrylic additi...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 26(2010), 18 vom: 21. Sept., Seite 14915-22
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| 1. Verfasser: |
Lee, Bong Kuk
(VerfasserIn) |
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| Weitere Verfasser: |
Cha, Nam-Goo,
Hong, Lan-Young,
Kim, Dong-Pyo,
Tanaka, Hidekazu,
Lee, Hea Yeon,
Kawai, Tomoji |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2010
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't
Organosilicon Compounds
Quaternary Ammonium Compounds
Resins, Synthetic
Solvents
3-(trimethoxysilyl)propyldimethyloctadecylammonium
27668-52-6
Oxygen
S88TT14065 |
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