Direct patterning of covalent organic monolayers on silicon using nanoimprint lithography
Two fabrication schemes are reported for the direct patterning of organic monolayers on oxide-free silicon, combining top-down nanoimprint lithography and bottom-up monolayer formation. The first approach was designed to form monolayer patterns on the imprinted areas, while the second approach was d...
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Détails bibliographiques
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 26(2010), 17 vom: 07. Sept., Seite 14210-5
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| Auteur principal: |
Voorthuijzen, W Pim
(Auteur) |
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| Autres auteurs: |
Yilmaz, M Deniz,
Gomez-Casado, Alberto,
Jonkheijm, Pascal,
van der Wiel, Wilfred G,
Huskens, Jurriaan |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2010
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids
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| Sujets: | Journal Article |
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