Periodic si nanopillar arrays fabricated by colloidal lithography and catalytic etching for broadband and omnidirectional elimination of Fresnel reflection

Periodic Si nanopillar arrays (NPAs) were fabricated by the colloidal lithography combined with catalytic etching. By varying the size of colloidal crystals using oxygen plasma etching, Si NPAs with desirable diameter and fill factor could be obtained. The Fresnel reflection can be eliminated effect...

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Publié dans:	Langmuir : the ACS journal of surfaces and colloids. - 1985. - 26(2010), 15 vom: 03. Aug., Seite 12855-8
Auteur principal:	Wang, Hsin-Ping (Auteur)
Autres auteurs:	Lai, Kun-Yu, Lin, Yi-Ruei, Lin, Chin-An, He, Jr-Hau
Format:	Article en ligne
Langue:	English
Publié:	2010
Accès à la collection:	Langmuir : the ACS journal of surfaces and colloids
Sujets:	Journal Article Research Support, Non-U.S. Gov't Silicon Z4152N8IUI