Rewritable superhydrophilic-superhydrophobic patterns on a sintered titanium dioxide substrate

This Letter describes a new fabrication process for superhydrophilic-superhydrophobic patterns on a TiO(2) surface using a combination of an inkjet technique and the site-selective decomposition of a self-assembled monolayer (SAM) by a photocatalytic reaction under UV irradiation. To induce high sur...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 26(2010), 14 vom: 20. Juli, Seite 11628-30
1. Verfasser: Nakata, Kazuya (VerfasserIn)
Weitere Verfasser: Nishimoto, Shunsuke, Yuda, Yumi, Ochiai, Tsuyoshi, Murakami, Taketoshi, Fujishima, Akira
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2010
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Water 059QF0KO0R titanium dioxide 15FIX9V2JP Titanium D1JT611TNE
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520 |a This Letter describes a new fabrication process for superhydrophilic-superhydrophobic patterns on a TiO(2) surface using a combination of an inkjet technique and the site-selective decomposition of a self-assembled monolayer (SAM) by a photocatalytic reaction under UV irradiation. To induce high surface wettability, we carried out simple calcination of a Ti substrate. The substrate was thus oxidized to titanium oxide and had a vortex-like rough morphology, which was suitable for the formation of wettability patterns. Furthermore, the substrate can be regenerated after elimination of the superhydrophilic-superhydrophobic patterns by the photocatalytic decomposition of TiO(2) using UV irradiation, and the patterns are deposited again. The renewed surface that we created had a wettability pattern that was different from the preceding pattern. This process is based on a TiO(2) surface and should offer a renewable, resource-saving, and environmentally friendly methodology for the formation of wettability patterns 
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650 4 |a Research Support, Non-U.S. Gov't 
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700 1 |a Nishimoto, Shunsuke  |e verfasserin  |4 aut 
700 1 |a Yuda, Yumi  |e verfasserin  |4 aut 
700 1 |a Ochiai, Tsuyoshi  |e verfasserin  |4 aut 
700 1 |a Murakami, Taketoshi  |e verfasserin  |4 aut 
700 1 |a Fujishima, Akira  |e verfasserin  |4 aut 
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