Nanoimprint lithography for functional three-dimensional patterns
Nanoimprint lithography (NIL) is viewed as an alternative nanopatterning technique to traditional photolithography, allowing micrometer-scale and sub-hundred-nanometer resolution as well as three-dimensional structure fabrication. In this Research News article we highlight current activities towards...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 22(2010), 32 vom: 24. Aug., Seite 3608-14
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| 1. Verfasser: |
Ofir, Yuval
(VerfasserIn) |
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| Weitere Verfasser: |
Moran, Isaac W,
Subramani, Chandramouleeswaran,
Carter, Kenneth R,
Rotello, Vincent M |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2010
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| Zugriff auf das übergeordnete Werk: | Advanced materials (Deerfield Beach, Fla.)
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| Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't
Biocompatible Materials
Polymers |
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