Multiscale carbon structures fabricated by direct micropatterning of electrospun mats of SU-8 photoresist nanofibers

A novel method for the direct fabrication of arrays of micropatterned polymeric and carbon nanofiber structures on any substrate is developed. First SU-8, an epoxy-based negative photoresist, is electrospun under optimized conditions to produce a layer of polymeric nanofibers. Next, this nanofibrous...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 26(2010), 4 vom: 16. Feb., Seite 2218-22
1. Verfasser: Sharma, Chandra S (VerfasserIn)
Weitere Verfasser: Sharma, Ashutosh, Madou, Marc
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2010
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Epoxy Compounds Nanotubes, Carbon Polymers SU-8 compound Silicon Z4152N8IUI
Beschreibung
Zusammenfassung:A novel method for the direct fabrication of arrays of micropatterned polymeric and carbon nanofiber structures on any substrate is developed. First SU-8, an epoxy-based negative photoresist, is electrospun under optimized conditions to produce a layer of polymeric nanofibers. Next, this nanofibrous mat is micropatterned using photolithography, and finally, pyrolysis produces ordered arrays of microdomains containing carbon nanofibers. The nanotextured surfaces of carbon nanofibers are shown to be very hydrophobic (water contact angle approximately 130 degrees). Micropatterning thus generates a substantial wettability contrast of nanofiber domains with intervening micropatches of very hydrophilic carbon (approximately 20 degrees) or silicon substrates
Beschreibung:Date Completed 26.04.2010
Date Revised 21.11.2013
published: Print
Citation Status MEDLINE
ISSN:1520-5827
DOI:10.1021/la904078r