Plasma enhanced chemical vapour deposition of silica onto Ti Analysis of surface chemistry, morphology and functional hydroxyl groups

Plasma enhanced chemical vapour deposition of silica onto Ti : Analysis of surface chemistry, morphology and functional hydroxyl groups

Previously, we have developed and characterised a procedure for the deposition of thin silica films by a plasma enhanced chemical vapour deposition (PECVD) procedure using tetraethoxysilane (TEOS) as the main precursor. We have used the silica coatings for improving the corrosion resistance of metal...

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Bibliographische Detailangaben
Veröffentlicht in:Surface science. - 1997. - 602(2008), 14 vom: 15. Juli, Seite 2402-2411
1. Verfasser: Szili, Endre J (VerfasserIn)
Weitere Verfasser: Kumar, Sunil, Smart, Roger St C, Lowe, Rachel, Saiz, Eduardo, Voelcker, Nicolas H
Format: Aufsatz
Sprache:English
Veröffentlicht: 2008
Zugriff auf das übergeordnete Werk:Surface science
Schlagworte:Journal Article