High-temperature anodized WO3 nanoplatelet films for photosensitive devices

Anodization at elevated temperatures in nitric acid has been used for the production of highly porous and thick tungsten trioxide nanostructured films for photosensitive device applications. The anodization process resulted in platelet crystals with thicknesses of 20-60 nm and lengths of 100-1000 nm...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 25(2009), 16 vom: 18. Aug., Seite 9545-51
1. Verfasser: Sadek, Abu Z (VerfasserIn)
Weitere Verfasser: Zheng, Haidong, Breedon, Michael, Bansal, Vipul, Bhargava, Suresh K, Latham, Kay, Zhu, Jianmin, Yu, Leshu, Hu, Zheng, Spizzirri, Paul G, Wlodarski, Wojtek, Kalantar-zadeh, Kourosh
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2009
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article