Structure and growth of vapor-deposited n-dotriacontane films studied by X-ray reflectivity

We have used synchrotron X-ray reflectivity measurements to investigate the structure of n-dotriacontane (n-C(32)H(66) or C32) films deposited from the vapor phase onto a SiO(2)-coated Si(100) surface. Our primary motivation was to determine whether the structure and growth mode of these films diffe...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 25(2009), 22 vom: 17. Nov., Seite 12962-7
1. Verfasser: del Campo, Valeria (VerfasserIn)
Weitere Verfasser: Cisternas, Edgardo, Taub, Haskell, Vergara, Ignacio, Corrales, Tomás, Soza, Pamela, Volkmann, Ulrich G, Bai, Mengjun, Wang, Siao-Kwan, Hansen, Flemming Y, Mo, Haiding, Ehrlich, Steven N
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2009
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article