Photochemical covalent attachment of alkene-derived monolayers onto hydroxyl-terminated silica

The functionalization of optically transparent substrates is of importance, for example, in the field of biosensing. In this article, a new method for modification of silica surfaces is presented that is based on a photochemical reaction of terminal alkenes with the surface. This yields highly hydro...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 25(2009), 19 vom: 06. Okt., Seite 11592-7
1. Verfasser: ter Maat, Jurjen (VerfasserIn)
Weitere Verfasser: Regeling, Remco, Yang, Menglong, Mullings, Marja N, Bent, Stacey F, Zuilhof, Han
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2009
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
LEADER 01000naa a22002652 4500
001 NLM189818808
003 DE-627
005 20231223184302.0
007 cr uuu---uuuuu
008 231223s2009 xx |||||o 00| ||eng c
024 7 |a 10.1021/la901551t  |2 doi 
028 5 2 |a pubmed24n0633.xml 
035 |a (DE-627)NLM189818808 
035 |a (NLM)19583192 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a ter Maat, Jurjen  |e verfasserin  |4 aut 
245 1 0 |a Photochemical covalent attachment of alkene-derived monolayers onto hydroxyl-terminated silica 
264 1 |c 2009 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 03.12.2009 
500 |a Date Revised 30.09.2009 
500 |a published: Print 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a The functionalization of optically transparent substrates is of importance, for example, in the field of biosensing. In this article, a new method for modification of silica surfaces is presented that is based on a photochemical reaction of terminal alkenes with the surface. This yields highly hydrophobic surfaces, which are thermally stable up to at least 400 degrees C. The formed monolayer provides chemical passivation of the underlying surface, according to studies showing successful blocking of platinum atomic layer deposition (ALD). The reaction is photochemically initiated, requiring light with a wavelength below 275 nm. X-ray photoelectron spectroscopy and infrared spectroscopy studies show that the alkenes initially bind to the surface hydroxyl groups in Markovnikov fashion. At prolonged reaction times (>5 h), however, oligomerization occurs, resulting in layer growth normal to the surface. The photochemical nature of the reaction enables the use of photolithography as a tool to constructively pattern silica surfaces. Atomic force microscopy shows that the features of the photomask are well transferred. The newly developed method can complement existing patterning methods on silica that are based on soft lithography 
650 4 |a Journal Article 
700 1 |a Regeling, Remco  |e verfasserin  |4 aut 
700 1 |a Yang, Menglong  |e verfasserin  |4 aut 
700 1 |a Mullings, Marja N  |e verfasserin  |4 aut 
700 1 |a Bent, Stacey F  |e verfasserin  |4 aut 
700 1 |a Zuilhof, Han  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Langmuir : the ACS journal of surfaces and colloids  |d 1992  |g 25(2009), 19 vom: 06. Okt., Seite 11592-7  |w (DE-627)NLM098181009  |x 1520-5827  |7 nnns 
773 1 8 |g volume:25  |g year:2009  |g number:19  |g day:06  |g month:10  |g pages:11592-7 
856 4 0 |u http://dx.doi.org/10.1021/la901551t  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_22 
912 |a GBV_ILN_350 
912 |a GBV_ILN_721 
951 |a AR 
952 |d 25  |j 2009  |e 19  |b 06  |c 10  |h 11592-7