A study of simultaneous patterning and alignment of semiconductor nanorods via polymerization-induced phase separation

We report simultaneous patterning and alignment of semiconductor nanorods (NRs) in nanorod-polymer films by using photolithographic polymerization-induced phase separation (PIPS). Exposure of the nanoparticle-monomer mixture to UV irradiation through a mask resulted in the site-specific photoinitiat...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 25(2009), 5 vom: 03. März, Seite 3173-7
1. Verfasser: Greener, Jesse (VerfasserIn)
Weitere Verfasser: van der Loop, Tibert Hendrik, Paquet, Chantal, Scholes, Gregory, Kumacheva, Eugenia
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2009
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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520 |a We report simultaneous patterning and alignment of semiconductor nanorods (NRs) in nanorod-polymer films by using photolithographic polymerization-induced phase separation (PIPS). Exposure of the nanoparticle-monomer mixture to UV irradiation through a mask resulted in the site-specific photoinitiated polymerization of the monomer, which was followed with flow of the NRs from the areas rich in polymer to the areas rich in monomer. The orientation of NRs in the direction of flow was trapped in the polymerized films and characterized in polarization absorption experiments 
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700 1 |a van der Loop, Tibert Hendrik  |e verfasserin  |4 aut 
700 1 |a Paquet, Chantal  |e verfasserin  |4 aut 
700 1 |a Scholes, Gregory  |e verfasserin  |4 aut 
700 1 |a Kumacheva, Eugenia  |e verfasserin  |4 aut 
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