Style de citation APA

Bardea, A., & Naaman, R. (2009). Submicrometer chemical patterning with high throughput using magnetolithography. Langmuir : the ACS journal of surfaces and colloids, 25(10), 5451. https://doi.org/10.1021/la900601w

Style de citation Chicago

Bardea, Amos, et Ron Naaman. "Submicrometer Chemical Patterning with High Throughput Using Magnetolithography." Langmuir : The ACS Journal of Surfaces and Colloids 25, no. 10 (2009): 5451. https://dx.doi.org/10.1021/la900601w.

Style de citation MLA

Bardea, Amos, et Ron Naaman. "Submicrometer Chemical Patterning with High Throughput Using Magnetolithography." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 25, no. 10, 2009, p. 5451.