Covalently attached organic monolayers on SiC and SixN4 surfaces : formation using UV light at room temperature

We describe the formation of alkyl monolayers on silicon carbide (SiC) and silicon-rich silicon nitride (SixN4) surfaces, using UV irradiation in the presence of alkenes. Both the surface preparation and the monolayer attachment were carried out under ambient conditions. The stable coatings obtained...

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Détails bibliographiques
Publié dans:Langmuir : the ACS journal of surfaces and colloids. - 1985. - 25(2009), 4 vom: 17. Feb., Seite 2172-80
Auteur principal: Rosso, Michel (Auteur)
Autres auteurs: Giesbers, Marcel, Arafat, Ahmed, Schroën, Karin, Zuilhof, Han
Format: Article en ligne
Langue:English
Publié: 2009
Accès à la collection:Langmuir : the ACS journal of surfaces and colloids
Sujets:Journal Article Research Support, Non-U.S. Gov't Carbon Compounds, Inorganic Silicon Compounds silicon nitride QHB8T06IDK silicon carbide WXQ6E537EW
Description
Résumé:We describe the formation of alkyl monolayers on silicon carbide (SiC) and silicon-rich silicon nitride (SixN4) surfaces, using UV irradiation in the presence of alkenes. Both the surface preparation and the monolayer attachment were carried out under ambient conditions. The stable coatings obtained in this way were studied by water contact angle measurements, infrared reflection absorption spectroscopy, X-ray reflectivity, and X-ray photoelectron spectroscopy. Besides unfunctionalized 1-alkenes, methyl undec-10-enoate, and 2,2,2-trifluoroethyl undec-10-enoate were also grafted onto both substrates. The resulting ester-terminated surfaces could then be further reacted after hydrolysis using amide chemistry to easily allow the attachment of amine-containing compounds
Description:Date Completed 31.03.2009
Date Revised 25.09.2018
published: Print
Citation Status MEDLINE
ISSN:1520-5827
DOI:10.1021/la803094y