Electron resist behavior of Pd hexadecanethiolate examined using X-ray photoelectron spectroscopy with nanometric lateral resolution
Electron resist behavior of Pd hexadecanethiolate is studied by varying the e-dosage from 2-280 muC.cm(-2). The e-beam exposed resist is characterized using energy dispersive spectroscopy, infrared spectroscopy, and X-ray photoelectron spectroscopy with nanometric lateral resolution. Electron beam e...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 25(2009), 2 vom: 20. Jan., Seite 1259-64
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| 1. Verfasser: |
Bhuvana, T
(VerfasserIn) |
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| Weitere Verfasser: |
Gregoratti, Luca,
Heun, Stefan,
Dalmiglio, Matteo,
Kulkarni, G U |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2009
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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