Fabrication of DNA nanowires by orthogonal self-assembly and DNA intercalation on a Au patterned Si/SiO2 surface

A novel Ru complex bearing both an acridine group and anchoring phosphonate groups was immobilized on a surface in order to capture double-stranded DNAs (dsDNAs) from solution. At low surface coverage, the atomic force microscopy (AFM) image revealed the "molecular dot" morphology with the...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 24(2008), 22 vom: 18. Nov., Seite 13203-11
1. Verfasser: Kobayashi, Katsuaki (VerfasserIn)
Weitere Verfasser: Tonegawa, Naoya, Fujii, Sho, Hikida, Jiro, Nozoye, Hisakazu, Tsutsui, Ken, Wada, Yasuo, Chikira, Makoto, Haga, Masa-Aki
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2008
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't 3-(4-methoxybenzoyl)propionic acid Intercalating Agents Metals Organophosphonates Phenyl Ethers Propionates Palladium 5TWQ1V240M mehr... Gold 7440-57-5 Silicon Dioxide 7631-86-9 DNA 9007-49-2 Zirconium C6V6S92N3C Silicon Z4152N8IUI
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100 1 |a Kobayashi, Katsuaki  |e verfasserin  |4 aut 
245 1 0 |a Fabrication of DNA nanowires by orthogonal self-assembly and DNA intercalation on a Au patterned Si/SiO2 surface 
264 1 |c 2008 
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500 |a Citation Status MEDLINE 
520 |a A novel Ru complex bearing both an acridine group and anchoring phosphonate groups was immobilized on a surface in order to capture double-stranded DNAs (dsDNAs) from solution. At low surface coverage, the atomic force microscopy (AFM) image revealed the "molecular dot" morphology with the height of the Ru complex ( approximately 2.5 nm) on a mica surface, indicating that four phosphonate anchor groups keep the Ru complex in an upright orientation on the surface. Using a dynamic molecular combing method, the DNA capture efficiency of the Ru complex on a mica surface was examined in terms of the effects of the number of molecular dots and surface hydrophobicity. The immobilized surface could capture DNAs; however, the optimal number of molecular dots on the surface as well as the optimal pull-up speed exist to obtain the extended dsDNAs on the surface. Applying this optimal condition to a Au-patterned Si/SiO 2 (Au/SiO 2) surface, the Au electrode was selectively covered with the Ru complex by orthogonal self-assembly of 4-mercaptbutylphosphonic acid (MBPA), followed by the formation of a Zr (4+)-phosphonate layer and the Ru complex. At the same time, the remaining SiO 2 surface was covered with octylphosphonic acid (OPA) by self-assembly. The selective immobilization of the Ru complex only on the Au electrode was identified by time-of-flight secondary-ion mass spectrometry (TOF-SIMS) imaging on the chemically modified Au/SiO 2 surface. The construction of DNA nanowires on the Au/SiO 2 patterned surface was accomplished by the molecular combing method of the selective immobilized Ru complex on Au electrodes. These interconnected nanowires between Au electrodes were used as a scaffold for the modification of Pd nanoparticles on the DNA. Furthermore, Cu metallization was achieved by electroless plating of Cu metal on a priming of Pd nanoparticles on the Pd-covered DNA nanowires. The resulting Cu nanowires showed a metallic behavior with relatively high resistance 
650 4 |a Journal Article 
650 4 |a Research Support, Non-U.S. Gov't 
650 7 |a 3-(4-methoxybenzoyl)propionic acid  |2 NLM 
650 7 |a Intercalating Agents  |2 NLM 
650 7 |a Metals  |2 NLM 
650 7 |a Organophosphonates  |2 NLM 
650 7 |a Phenyl Ethers  |2 NLM 
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650 7 |a Palladium  |2 NLM 
650 7 |a 5TWQ1V240M  |2 NLM 
650 7 |a Gold  |2 NLM 
650 7 |a 7440-57-5  |2 NLM 
650 7 |a Silicon Dioxide  |2 NLM 
650 7 |a 7631-86-9  |2 NLM 
650 7 |a DNA  |2 NLM 
650 7 |a 9007-49-2  |2 NLM 
650 7 |a Zirconium  |2 NLM 
650 7 |a C6V6S92N3C  |2 NLM 
650 7 |a Silicon  |2 NLM 
650 7 |a Z4152N8IUI  |2 NLM 
700 1 |a Tonegawa, Naoya  |e verfasserin  |4 aut 
700 1 |a Fujii, Sho  |e verfasserin  |4 aut 
700 1 |a Hikida, Jiro  |e verfasserin  |4 aut 
700 1 |a Nozoye, Hisakazu  |e verfasserin  |4 aut 
700 1 |a Tsutsui, Ken  |e verfasserin  |4 aut 
700 1 |a Wada, Yasuo  |e verfasserin  |4 aut 
700 1 |a Chikira, Makoto  |e verfasserin  |4 aut 
700 1 |a Haga, Masa-Aki  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Langmuir : the ACS journal of surfaces and colloids  |d 1992  |g 24(2008), 22 vom: 18. Nov., Seite 13203-11  |w (DE-627)NLM098181009  |x 1520-5827  |7 nnns 
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