Nanohole structure prepared by a polystyrene-block-poly(methyl methacrylate)/poly(methyl methacrylate) mixture film

Cylindrical nanoporous structures were prepared by using a mixture film of polystyrene-block-poly(methyl methacrylate) copolymer (PS-b-PMMA) and PMMA homopolymer (hPMMA), and they were analyzed by transmission electron microtomography (TEMT), X-ray reflectivity (XR), and grazing incidence small-angl...

Ausführliche Beschreibung

Bibliographische Detailangaben
Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 24(2008), 21 vom: 04. Nov., Seite 12612-7
1. Verfasser: Joo, Wonchul (VerfasserIn)
Weitere Verfasser: Yang, Seung Yun, Kim, Jin Kon, Jinnai, Hiroshi
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2008
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
LEADER 01000naa a22002652 4500
001 NLM182859665
003 DE-627
005 20231223163603.0
007 cr uuu---uuuuu
008 231223s2008 xx |||||o 00| ||eng c
024 7 |a 10.1021/la8021134  |2 doi 
028 5 2 |a pubmed24n0610.xml 
035 |a (DE-627)NLM182859665 
035 |a (NLM)18837525 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Joo, Wonchul  |e verfasserin  |4 aut 
245 1 0 |a Nanohole structure prepared by a polystyrene-block-poly(methyl methacrylate)/poly(methyl methacrylate) mixture film 
264 1 |c 2008 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 01.12.2008 
500 |a Date Revised 30.10.2008 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a Cylindrical nanoporous structures were prepared by using a mixture film of polystyrene-block-poly(methyl methacrylate) copolymer (PS-b-PMMA) and PMMA homopolymer (hPMMA), and they were analyzed by transmission electron microtomography (TEMT), X-ray reflectivity (XR), and grazing incidence small-angle X-ray scattering. For this purpose, the mixture film was spin-coated onto a silicon wafer modified by a neutral brush for PS and PMMA blocks, which generates PMMA cylindrical microdomains oriented normal to the substrate. Two methods were employed to prepare nanoporous structures: (1) all of the PMMA phase (PMMA block and PMMA homopolymer) in the film was removed by UV irradiation, followed by rinsing with a selective solvent (acetic acid) to PMMA and (2) only PMMA homopolymer was removed by selective solvent etching without UV irradiation. We found via TEMT and XR that the nanoporous structure in the film prepared by UV irradiation exhibited almost perfect cylindrical shape throughout the entire film thickness. However, when the film was rinsed with a selective solvent, nanoporous structures were not straight cylinders but had a funnel shape in which the diameter of nanopores located near the top of the film was larger than that located near the bottom of the film 
650 4 |a Journal Article 
700 1 |a Yang, Seung Yun  |e verfasserin  |4 aut 
700 1 |a Kim, Jin Kon  |e verfasserin  |4 aut 
700 1 |a Jinnai, Hiroshi  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Langmuir : the ACS journal of surfaces and colloids  |d 1992  |g 24(2008), 21 vom: 04. Nov., Seite 12612-7  |w (DE-627)NLM098181009  |x 1520-5827  |7 nnns 
773 1 8 |g volume:24  |g year:2008  |g number:21  |g day:04  |g month:11  |g pages:12612-7 
856 4 0 |u http://dx.doi.org/10.1021/la8021134  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_22 
912 |a GBV_ILN_350 
912 |a GBV_ILN_721 
951 |a AR 
952 |d 24  |j 2008  |e 21  |b 04  |c 11  |h 12612-7