Patterning of conducting polymers using charged self-assembled monolayers
We introduce a new approach to pattern conducting polymers by combining oppositely charged conducting polymers on charged self-assembled monolayers (SAMs). The polymer resist pattern behaves as a physical barrier, preventing the formation of SAMs. The patterning processes were carried out using comm...
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 24(2008), 17 vom: 02. Sept., Seite 9825-31 |
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| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2008
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids |
| Sujets: | Journal Article |
| Accès en ligne |
Volltext |