Grayscale patterning of polymer thin films with nanometer precision by direct-write multiphoton photolithography

The fabrication of arbitrary grayscale patterns in poly(ethylene dioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) thin films is demonstrated. Patterns are formed by ablative direct-write multiphoton lithography using a sample scanning microscope and 870-nm light from a mode-locked Ti:sapphire las...

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Veröffentlicht in:	Langmuir : the ACS journal of surfaces and colloids. - 1992. - 24(2008), 16 vom: 19. Aug., Seite 8939-43
1. Verfasser:	Yao, Xiao (VerfasserIn)
Weitere Verfasser:	Ito, Takashi, Higgins, Daniel A
Format:	Online-Aufsatz
Sprache:	English
Veröffentlicht:	2008
Zugriff auf das übergeordnete Werk:	Langmuir : the ACS journal of surfaces and colloids
Schlagworte:	Journal Article Research Support, Non-U.S. Gov't Research Support, U.S. Gov't, Non-P.H.S. Bridged Bicyclo Compounds, Heterocyclic Polymers Polystyrenes poly(3,4-ethylene dioxythiophene) polystyrene sulfonic acid 70KO0R01RY