The reversible giant change in the contact angle on the polysulfone and polyethersulfone films exposed to UV irradiation

Water contact angles on polysulfone and polyethersulfone films exposed to UV irradiation have been found to decrease dramatically. We relate this phenomenon to the formation and release of disulfonic acid from the irradiated films, a well-known surfactant. The phenomenon appears to be reversible, na...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 24(2008), 12 vom: 17. Juni, Seite 5977-80
1. Verfasser: Bormashenko, Edward (VerfasserIn)
Weitere Verfasser: Pogreb, Roman, Whyman, Gene, Bormashenko, Yelena, Jager, Rachel, Stein, Tamir, Schechter, Alex, Aurbach, Doron
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2008
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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245 1 4 |a The reversible giant change in the contact angle on the polysulfone and polyethersulfone films exposed to UV irradiation 
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520 |a Water contact angles on polysulfone and polyethersulfone films exposed to UV irradiation have been found to decrease dramatically. We relate this phenomenon to the formation and release of disulfonic acid from the irradiated films, a well-known surfactant. The phenomenon appears to be reversible, namely, cleansed surfaces retained their initial contact angle. The revealed phenomenon may provide a means of controlling the spreading of liquids on polysulfone and polyethersulfone films and seems promising for use in microfluidics applications 
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700 1 |a Pogreb, Roman  |e verfasserin  |4 aut 
700 1 |a Whyman, Gene  |e verfasserin  |4 aut 
700 1 |a Bormashenko, Yelena  |e verfasserin  |4 aut 
700 1 |a Jager, Rachel  |e verfasserin  |4 aut 
700 1 |a Stein, Tamir  |e verfasserin  |4 aut 
700 1 |a Schechter, Alex  |e verfasserin  |4 aut 
700 1 |a Aurbach, Doron  |e verfasserin  |4 aut 
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