On the mechanism of low-pressure imprint lithography : capillarity vs viscous flow
Dominant mechanisms in low-pressure imprint lithography processes have been identified for the regimes that are definable in terms of applied pressure, temperature, and mold material characteristics. Capillarity is found to be the dominant mechanism at high temperature and low pressure when stiff, h...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1999. - 24(2008), 10 vom: 20. Mai, Seite 5459-63 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
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2008
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article Research Support, Non-U.S. Gov't Polymers |
| Zusammenfassung: | Dominant mechanisms in low-pressure imprint lithography processes have been identified for the regimes that are definable in terms of applied pressure, temperature, and mold material characteristics. Capillarity is found to be the dominant mechanism at high temperature and low pressure when stiff, hard molds are used. In the case of flexible thin-film ( approximately 20 microm) molds, both the capillarity and the viscous flow are involved. Both mechanisms are operative in the initial stage of the imprinting, but the capillarity takes over as time progresses |
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| Beschreibung: | Date Completed 10.07.2008 Date Revised 17.11.2011 published: Print-Electronic Citation Status MEDLINE |
| ISSN: | 1520-5827 |
| DOI: | 10.1021/la703084p |