Porphyrin-based photocatalytic lithography
Photocatalytic lithography couples light with photoreactive coated mask materials to pattern surface chemistry. We excite porphyrins to create radical species that photocatalytically oxidize, and thereby pattern, chemistries in the local vicinity. The technique advantageously is suited for use with...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 24(2008), 9 vom: 06. Mai, Seite 5179-84
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| 1. Verfasser: |
Bearinger, Jane P
(VerfasserIn) |
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| Weitere Verfasser: |
Stone, Gary,
Christian, Allen T,
Dugan, Lawrence,
Hiddessen, Amy L,
Wu, Kuang Jen J,
Wu, Ligang,
Hamilton, Julie,
Stockton, Cheryl,
Hubbell, Jeffrey A |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2008
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article
Research Support, N.I.H., Extramural
Research Support, U.S. Gov't, Non-P.H.S.
Photosensitizing Agents
Porphyrins |
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