Characterization and electrical properties of chemical vapor deposited ferroelectric lead titanate films on titanium
Lead titanate thin films were deposited on titanium substrates by a chemical vapor deposition (CVD) process involving the application of vapor mixtures of Pb, ethyl titanate (Ti(C(2)H(5)O) (4)), and oxygen. Auger electron spectroscopy (AES) analyses were performed to determine the chemical compositi...
| Veröffentlicht in: | IEEE transactions on ultrasonics, ferroelectrics, and frequency control. - 1986. - 37(1990), 5 vom: 15., Seite 333-8 |
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| Format: | Aufsatz |
| Sprache: | English |
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1990
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| Zugriff auf das übergeordnete Werk: | IEEE transactions on ultrasonics, ferroelectrics, and frequency control |
| Schlagworte: | Journal Article |