Additive route to lithographically defined nanoporous silica, polymer, and carbon films
A facile method was investigated for patterning microporous and mesoporous silica, polymer, and carbon films using a combination of lithography and solid-state chemistry. This process exploits the difference in chemical reactivity between the lithographically exposed and unexposed regions to control...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 24(2008), 5 vom: 04. März, Seite 1648-53 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2008
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Online verfügbar |
Volltext |