Direct-write multiphoton photolithography : a systematic study of the etching behaviors in various commercial polymers
The nonlinear optical processes involved in etching thin polymer films by direct-write multiphoton photolithographic methods (Higgins et al. Appl. Phys. Lett. 2006, 88, 184101) are systematically explored. Power-dependent etching data are obtained for thin films of several commercial polymers, inclu...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 23(2007), 24 vom: 20. Nov., Seite 12406-12 |
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| Weitere Verfasser: | , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2007
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |