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|e rakwb
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|a eng
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| 100 |
1 |
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|a Yake, Allison M
|e verfasserin
|4 aut
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| 245 |
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|a Site-specific functionalization on individual colloids
|b size control, stability, and multilayers
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| 264 |
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|c 2007
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| 336 |
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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| 338 |
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|a Band
|b nc
|2 rdacarrier
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| 500 |
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|a Date Completed 17.09.2007
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|a Date Revised 08.08.2007
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a Individual colloidal particles are locally functionalized with nanoscale control. Here we use the particle lithography technique to mask one region of a silica or polystyrene particle (size 3.0 mum down to 170 nm), while the remaining 95% or more of the particle is coated with various sized nanocolloids. The images and data show precise and predictable control over the size of the region, with fine-tuned patch size control obtainable by changing the ionic strength of the solution. The coating on the particles remains stable even when subjected to sonication for 5 min. Both single regions and multilayer annuluses are readily formed. Particle lithography provides a general, reliable, stable, controllable, and scalable method for placing site-specific functionalizations on individual particles, opening the way to more complex particle patterning and the bottom-up assembly of more complex structures
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|a Journal Article
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|a Research Support, U.S. Gov't, Non-P.H.S.
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| 650 |
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|a Colloids
|2 NLM
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| 700 |
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|a Snyder, Charles E
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Velegol, Darrell
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 23(2007), 17 vom: 14. Aug., Seite 9069-75
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|x 1520-5827
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| 773 |
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|g volume:23
|g year:2007
|g number:17
|g day:14
|g month:08
|g pages:9069-75
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