Control of the microdomain orientation in block copolymer thin films with homopolymers for lithographic application
Block copolymer lithography is a promising method for fabricating periodical nanopatterns of less than 20 nm by self-assembly and can be applicable for fabricating patterned magnetic media with a recording density over 1 Tb/in.2. We found a simple technique to control the orientation of cylindrical...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1991. - 23(2007), 11 vom: 22. Mai, Seite 6404-10 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , , , , , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2007
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |