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231223s2006 xx ||||| 00| ||eng c |
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|a DE-627
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|e rakwb
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|a eng
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1 |
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|a Niemz, Angelika
|e verfasserin
|4 aut
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| 245 |
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|a Fabrication of nanoporous templates from diblock copolymer thin films on alkylchlorosilane-neutralized surfaces
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|c 2006
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|a Band
|b nc
|2 rdacarrier
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|a Date Completed 26.01.2007
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|a Date Revised 12.12.2006
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a The fabrication of nanoporous templates from poly(styrene)-b-poly(methyl methacrylate) diblock copolymer thin films (PS-b-PMMA, volume ratio 70:30) on silicon requires precise control of interfacial energies to achieve a perpendicular orientation of the PMMA cylindrical microdomains relative to the substrate. To provide a simple, rapid, yet tunable approach for surface neutralization, we investigated the self-assembled ordering of PS-b-PMMA diblock copolymer thin films on silicon substrates modified with a partial monolayer of octadecyldimethyl chlorosilane (ODMS), i.e., a layer of ODMS with a grafting density less than the maximum possible monolayer surface coverage. We demonstrate herein the fabrication of nanoporous PS templates from annealed PS-b-PMMA diblock copolymer thin films on these partial ODMS SAMs
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|a Journal Article
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|a Bandyopadhyay, Krisanu
|e verfasserin
|4 aut
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|a Tan, Eric
|e verfasserin
|4 aut
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1 |
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|a Cha, Kitty
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Baker, Shenda M
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 22(2006), 26 vom: 19. Dez., Seite 11092-6
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
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|g volume:22
|g year:2006
|g number:26
|g day:19
|g month:12
|g pages:11092-6
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|a AR
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|d 22
|j 2006
|e 26
|b 19
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|h 11092-6
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