Relative humidity effects in dip-pen nanolithography of alkanethiol mixtures
In the dip-pen nanolithography of a binary alkanethiol mixture of mercaptohexadecanoic acid (MHA) and 1-octadecanethiol (ODT) at a relative humidity (RH) of less than 80%, two distinct phases of MHA and ODT were patterned. However, on ramping up the RH to greater than 80%, only MHA was observed to p...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 22(2006), 26 vom: 19. Dez., Seite 10912-4 |
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| Format: | Aufsatz |
| Sprache: | English |
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2006
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |