Fabrication and functionalization of nanochannels by electron-beam-induced silicon oxide deposition
We report on the fabrication and electrical characterization of functionalized solid-state nanopores in low stress silicon nitride membranes. First, a pore of approximately 50 nm diameter was drilled using a focused ion beam technique, followed by the local deposition of silicon dioxide. A low-energ...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 22(2006), 25 vom: 05. Dez., Seite 10711-5 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2006
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article Research Support, Non-U.S. Gov't Silicon Dioxide 7631-86-9 |