Block copolymer film with sponge-like nanoporous strucutre for antireflection coating
We prepared nanoporous films by spin-coating of polystyrene-block-poly(methyl methacrylate) copolymers (PS-b-PMMA) to a glass and irradiating by ultra-violet source followed by selective removal of PMMA blocks with acetic acid. When spin-coated PS-b-PMMA was no longer annealed at high temperatures,...
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 22(2006), 19 vom: 12. Sept., Seite 7960-3 |
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| Auteur principal: | |
| Autres auteurs: | , |
| Format: | Article |
| Langue: | English |
| Publié: |
2006
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids |
| Sujets: | Journal Article Research Support, Non-U.S. Gov't Membranes, Artificial Methacrylates Polystyrenes polystyrene-block-poly(methyl methacrylate) Polymethyl Methacrylate 9011-14-7 |
| Résumé: | We prepared nanoporous films by spin-coating of polystyrene-block-poly(methyl methacrylate) copolymers (PS-b-PMMA) to a glass and irradiating by ultra-violet source followed by selective removal of PMMA blocks with acetic acid. When spin-coated PS-b-PMMA was no longer annealed at high temperatures, microphase separation between two blocks occurred only in the short-range scale. The porous films prepared from PS-b-PMMA with the volume fraction of PMMA block of 0.69 exhibited a spongelike nanoporous structure over the entire film thickness and showed excellent antireflection with a minimum reflection less than 0.1% at visible and near-infrared wavelengths. The observed reflectances were in good agreement with the predictions based on the characteristic matrix theory |
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| Description: | Date Completed 06.09.2007 Date Revised 05.09.2006 published: Print Citation Status MEDLINE |
| ISSN: | 1520-5827 |