Block copolymer film with sponge-like nanoporous strucutre for antireflection coating

We prepared nanoporous films by spin-coating of polystyrene-block-poly(methyl methacrylate) copolymers (PS-b-PMMA) to a glass and irradiating by ultra-violet source followed by selective removal of PMMA blocks with acetic acid. When spin-coated PS-b-PMMA was no longer annealed at high temperatures,...

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Bibliographische Detailangaben
Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 22(2006), 19 vom: 12. Sept., Seite 7960-3
1. Verfasser: Joo, Wonchul (VerfasserIn)
Weitere Verfasser: Park, Min Soo, Kim, Jin Kon
Format: Aufsatz
Sprache:English
Veröffentlicht: 2006
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Membranes, Artificial Methacrylates Polystyrenes polystyrene-block-poly(methyl methacrylate) Polymethyl Methacrylate 9011-14-7
Beschreibung
Zusammenfassung:We prepared nanoporous films by spin-coating of polystyrene-block-poly(methyl methacrylate) copolymers (PS-b-PMMA) to a glass and irradiating by ultra-violet source followed by selective removal of PMMA blocks with acetic acid. When spin-coated PS-b-PMMA was no longer annealed at high temperatures, microphase separation between two blocks occurred only in the short-range scale. The porous films prepared from PS-b-PMMA with the volume fraction of PMMA block of 0.69 exhibited a spongelike nanoporous structure over the entire film thickness and showed excellent antireflection with a minimum reflection less than 0.1% at visible and near-infrared wavelengths. The observed reflectances were in good agreement with the predictions based on the characteristic matrix theory
Beschreibung:Date Completed 06.09.2007
Date Revised 05.09.2006
published: Print
Citation Status MEDLINE
ISSN:1520-5827