Heavyweight dendritic inks for positive microcontact printing

Poly(propylene imine) dendrimers with dialkyl sulfide end groups were prepared and developed as inks for positive microcontact printing ((+)muCP) on gold. Long (C10H21-S-C10H20-), medium (C3H7-S-C4H8-), and short (CH3-S-CH2-) dialkyl sulfide end groups were attached to second- and third-generation P...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 22(2006), 18 vom: 29. Aug., Seite 7568-73
1. Verfasser: Perl, András (VerfasserIn)
Weitere Verfasser: Péter, Maria, Ravoo, Bart Jan, Reinhoudt, David N, Huskens, Jurriaan
Format: Aufsatz
Sprache:English
Veröffentlicht: 2006
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
LEADER 01000naa a22002652 4500
001 NLM164904654
003 DE-627
005 20231223103539.0
007 tu
008 231223s2006 xx ||||| 00| ||eng c
028 5 2 |a pubmed24n0550.xml 
035 |a (DE-627)NLM164904654 
035 |a (NLM)16922534 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Perl, András  |e verfasserin  |4 aut 
245 1 0 |a Heavyweight dendritic inks for positive microcontact printing 
264 1 |c 2006 
336 |a Text  |b txt  |2 rdacontent 
337 |a ohne Hilfsmittel zu benutzen  |b n  |2 rdamedia 
338 |a Band  |b nc  |2 rdacarrier 
500 |a Date Completed 21.09.2007 
500 |a Date Revised 22.08.2006 
500 |a published: Print 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a Poly(propylene imine) dendrimers with dialkyl sulfide end groups were prepared and developed as inks for positive microcontact printing ((+)muCP) on gold. Long (C10H21-S-C10H20-), medium (C3H7-S-C4H8-), and short (CH3-S-CH2-) dialkyl sulfide end groups were attached to second- and third-generation PPI dendrimers to create a family of dendritic sulfides. The dendritic inks flatten upon adsorption and form monolayers on gold. (+)muCP was performed on gold using commercially available poly(dimethylsiloxane) as stamp material and n-octadecanethiol as etch resist. The gold beneath the dendrimers was selectively etched away with an acidic Fe(NO3)3/thiourea solution to give the positive copy of the original master pattern. The multivalent sulfide attachment and the relatively high molecular mass of these dendrimers ensured minimal lateral ink spreading and thus optimal feature reproducibility. Contact times were varied to analyze the spreading rates of the dendritic inks. The spreading rates of the dendritic inks were found to be much lower than that of pentaerythritol tetrakis(3-mercaptopropionate). (+)muCP with the new inks was extended to submicrometer features. Optical microscopy, scanning electron microscopy, and atomic force microscopy were used to characterize the etched samples. Lines with a width of 100 nm were faithfully replicated with the third-generation dendrimers bearing medium (C3-S-C4-) end groups 
650 4 |a Journal Article 
700 1 |a Péter, Maria  |e verfasserin  |4 aut 
700 1 |a Ravoo, Bart Jan  |e verfasserin  |4 aut 
700 1 |a Reinhoudt, David N  |e verfasserin  |4 aut 
700 1 |a Huskens, Jurriaan  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Langmuir : the ACS journal of surfaces and colloids  |d 1992  |g 22(2006), 18 vom: 29. Aug., Seite 7568-73  |w (DE-627)NLM098181009  |x 1520-5827  |7 nnns 
773 1 8 |g volume:22  |g year:2006  |g number:18  |g day:29  |g month:08  |g pages:7568-73 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_22 
912 |a GBV_ILN_350 
912 |a GBV_ILN_721 
951 |a AR 
952 |d 22  |j 2006  |e 18  |b 29  |c 08  |h 7568-73