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231223s2006 xx ||||| 00| ||eng c |
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|a pubmed24n0548.xml
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|a (DE-627)NLM164345442
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|a (NLM)16863261
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a Gonuguntla, Manoj
|e verfasserin
|4 aut
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| 245 |
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|a Control of self-organized contact instability and patterning in soft elastic films
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|c 2006
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| 336 |
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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| 338 |
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|a Band
|b nc
|2 rdacarrier
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| 500 |
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|a Date Completed 03.08.2007
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|a Date Revised 25.07.2006
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a The surface of a soft elastic film becomes unstable and forms a labyrinth pattern when a rigid flat plate is brought into adhesive contact, without application of any external pressure. These isotropic undulations have a characteristic wavelength, lambda approximately 3H, where H is the film thickness. We present here technique of ordering, aligning, and modulating these micro-labyrinth structures by using a patterned stamp, by varying the stamp-film inter-surface distance, by a lateral confinement of the instability and even by a simple shear motion of a flat stamp. Many complex structures, such as an array of femto-liter beakers and doubly periodic channels, are generated from a simple stamp consisting of parallel channels. The elastic nature of the patterns allows an in-situ tuning, manipulation, and reconfiguration of the microstructures. Regardless of their precise morphology, the structures continue to have the elastic length scale, lambda approximately 3H. The structures can also be made permanent as required by UV-ozone-induced oxidation of the structures. The underlying principles of the elastic contact instability presented here have the potential to develop into a new soft lithography technique-elastic contact lithography (ECL), allowing a simple, rapid and large area patterning of soft solids
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|a Journal Article
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|a Sharma, Ashutosh
|e verfasserin
|4 aut
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1 |
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|a Mukherjee, Rabibrata
|e verfasserin
|4 aut
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| 700 |
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|a Subramanian, Subash A
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 22(2006), 16 vom: 01. Aug., Seite 7066-71
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
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|g volume:22
|g year:2006
|g number:16
|g day:01
|g month:08
|g pages:7066-71
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|a GBV_USEFLAG_A
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| 912 |
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|a SYSFLAG_A
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| 912 |
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|a GBV_NLM
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| 912 |
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|a GBV_ILN_22
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| 912 |
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|a GBV_ILN_350
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| 912 |
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|a GBV_ILN_721
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| 951 |
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|a AR
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| 952 |
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|d 22
|j 2006
|e 16
|b 01
|c 08
|h 7066-71
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