Alkene/diamond liquid/solid interface characterization using internal photoemission spectroscopy

The photochemical attachment of 10-amino-dec-1-ene molecules protected with a trifluoroacetic acid group (TFAAD) on hydrogen-terminated single-crystalline chemical vapor deposited (CVD) diamond is characterized by total photoyield spectroscopy (TPYS), conductivity, Hall-effect, spectrally resolved p...

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Détails bibliographiques
Publié dans:Langmuir : the ACS journal of surfaces and colloids. - 1985. - 22(2006), 13 vom: 20. Juni, Seite 5645-53
Auteur principal: Nebel, C E (Auteur)
Autres auteurs: Shin, D, Takeuchi, D, Yamamoto, T, Watanabe, H, Nakamura, T
Format: Article
Langue:English
Publié: 2006
Accès à la collection:Langmuir : the ACS journal of surfaces and colloids
Sujets:Journal Article Alkenes Diamond 7782-40-3 Trifluoroacetic Acid E5R8Z4G708