In Situ Detection of Surface SiH(n) in Synchrotron-Radiation-Induced Chemical Vapor Deposition of a-Si on an SiO(2) Substrate
The sensitivity and linearity of infrared reflection absorption spectroscopy (IRAS) has been significantly improved by using a buried-metal-layer (BML) substrate having an SiO(2)(15 nm)/Al(200 nm)/Si(100) structure, instead of a plain Si(100) substrate. By applying this BML-IRAS technique to the in...
| Veröffentlicht in: | Journal of synchrotron radiation. - 1994. - 2(1995), Pt 4 vom: 01. Juli, Seite 196-200 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , , , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
1995
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| Zugriff auf das übergeordnete Werk: | Journal of synchrotron radiation |
| Schlagworte: | Journal Article |