Electron beam irradiation of poly(vinyl methyl ether) films. 2. Temperature-dependent swelling behavior

Temperature-sensitive hydrogel films were synthesized by electron beam irradiation of poly(vinyl methyl ether) (PVME) on silicon (Si/SiO(2)) substrates and gold (Au) coated glass slides. The temperature-dependent swelling behavior of the films in aqueous solution was characterized by in situ spectro...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 22(2006), 11 vom: 23. Mai, Seite 5152-9
1. Verfasser: Hegewald, Jan (VerfasserIn)
Weitere Verfasser: Schmidt, Thomas, Eichhorn, Klaus-Jochen, Kretschmer, Katja, Kuckling, Dirk, Arndt, Karl-Friedrich
Format: Aufsatz
Sprache:English
Veröffentlicht: 2006
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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245 1 0 |a Electron beam irradiation of poly(vinyl methyl ether) films. 2. Temperature-dependent swelling behavior 
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520 |a Temperature-sensitive hydrogel films were synthesized by electron beam irradiation of poly(vinyl methyl ether) (PVME) on silicon (Si/SiO(2)) substrates and gold (Au) coated glass slides. The temperature-dependent swelling behavior of the films in aqueous solution was characterized by in situ spectroscopic ellipsometry and a combination of surface plasmon resonance (SPR) and optical waveguide spectroscopy (OWS). The results of both techniques are compared. The suitability of both techniques for the characterization of the swelling behavior of thin hydrogel films is demonstrated. The volume swelling degree in the swollen state decreases with increasing radiation dose D. This is explained by the fact that the number of formed polymeric radicals, and hence cross-linking density, increases with D. Above the phase-transition temperature, the swelling degrees were independent of D, slightly above 1. The swelling/deswelling process was fully reversible and is mainly directed perpendicular to the substrate surface. The phase-transition temperature was determined to be T(cr) approximately 33 degrees C. However, T(cr) slightly decreases with increasing D and increasing film thickness d 
650 4 |a Journal Article 
700 1 |a Schmidt, Thomas  |e verfasserin  |4 aut 
700 1 |a Eichhorn, Klaus-Jochen  |e verfasserin  |4 aut 
700 1 |a Kretschmer, Katja  |e verfasserin  |4 aut 
700 1 |a Kuckling, Dirk  |e verfasserin  |4 aut 
700 1 |a Arndt, Karl-Friedrich  |e verfasserin  |4 aut 
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