Lithography for imprinting colored patterns with quantum dots
In this article, we report a new form of lithography that involves a reaction between a gas and an ion embedded in a polymer film. The principle is based on a combination of top-down and bottom-up approaches in which a transmission electron microscope grid is placed on a poly(vinylpyrrolidone) film...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 22(2006), 7 vom: 28. März, Seite 3439-44 |
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| Weitere Verfasser: | , , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2006
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |