Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography

In this paper, we fabricated a fluorinated organic-inorganic hybrid mold using a nonhydrolytic sol-gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecul...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 21(2005), 21 vom: 11. Okt., Seite 9390-2
1. Verfasser: Choi, Dae-Geun (VerfasserIn)
Weitere Verfasser: Jeong, Jun-ho, Sim, Young-suk, Lee, Eung-sug, Kim, Woo-Soo, Bae, Byeong-Soo
Format: Aufsatz
Sprache:English
Veröffentlicht: 2005
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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245 1 0 |a Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography 
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520 |a In this paper, we fabricated a fluorinated organic-inorganic hybrid mold using a nonhydrolytic sol-gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecules in the backbone. The other advantages of the hybrid mold are thermal stability over 300 degrees C. The hybrid mold produced from UV nanoimprint lithography (UV-NIL) was used as a mold for the next UV-NIL and soft lithography without requiring use of an antisticking layer. Various nanometer scale patterns including sub-100 nm patterns could be obtained from the hybrid mold. Nanopatterning processes using this low-cost mold are useful because they preserve the expensive original master 
650 4 |a Journal Article 
700 1 |a Jeong, Jun-ho  |e verfasserin  |4 aut 
700 1 |a Sim, Young-suk  |e verfasserin  |4 aut 
700 1 |a Lee, Eung-sug  |e verfasserin  |4 aut 
700 1 |a Kim, Woo-Soo  |e verfasserin  |4 aut 
700 1 |a Bae, Byeong-Soo  |e verfasserin  |4 aut 
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