Electrostatic double layer force between a sphere and a planar substrate in the presence of previously deposited spherical particles

A finite element model of the electrostatic double layer interaction between an approaching colloidal particle and a small region of a charged planar surface containing four previously deposited particles is presented. The electrostatic interaction force experienced by the approaching particle is ob...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 21(2005), 10 vom: 10. Mai, Seite 4755-64
1. Verfasser: Das, Prodip K (VerfasserIn)
Weitere Verfasser: Bhattacharjee, Subir
Format: Aufsatz
Sprache:English
Veröffentlicht: 2005
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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245 1 0 |a Electrostatic double layer force between a sphere and a planar substrate in the presence of previously deposited spherical particles 
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520 |a A finite element model of the electrostatic double layer interaction between an approaching colloidal particle and a small region of a charged planar surface containing four previously deposited particles is presented. The electrostatic interaction force experienced by the approaching particle is obtained by solving the Poisson-Boltzmann equation with appropriate boundary conditions representing this complex geometry. The interaction forces obtained from the detailed three-dimensional finite element simulations suggest that for the many-body scenario addressed here, the electrostatic double layer repulsion experienced by the approaching particle is less than the corresponding sphere-plate interaction due to the presence of the previously deposited particles. The reduction in force is quite significant when the screening length of the electric double layer becomes comparable to the particle radius (kappaa approximately 1). The results also suggest that the commonly used technique of pairwise addition of binary interactions can grossly overestimate the net electrostatic double layer interaction forces in such situations. The simulation methodology presented here can form a basis for investigating the influence of several previously deposited particles on the electrostatic repulsion experienced by a particle during deposition onto a substrate 
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