APA Zitierstil

Jung, G., Li, Z., Wu, W., Ganapathiappan, S., Li, X., Olynick, D. L., . . . Williams, R. S. (2005). Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate-surface functionalization. Langmuir : the ACS journal of surfaces and colloids, 21(14), 6127.

Chicago Zitierstil

Jung, Gun-Young, Zhiyong Li, Wei Wu, S. Ganapathiappan, Xuema Li, Deirdre L. Olynick, S Y. Wang, William M. Tong, und R Stanley Williams. "Improved Pattern Transfer in Nanoimprint Lithography at 30 Nm Half-pitch by Substrate-surface Functionalization." Langmuir : The ACS Journal of Surfaces and Colloids 21, no. 14 (2005): 6127.

MLA Zitierstil

Jung, Gun-Young, et al. "Improved Pattern Transfer in Nanoimprint Lithography at 30 Nm Half-pitch by Substrate-surface Functionalization." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 21, no. 14, 2005, p. 6127.