Decomposition processes of an organic monolayer formed on Si(111) via a silicon-carbon bond induced by exposure to UV irradiation or ozone

The decomposition processes of an organic monolayer, which was formed on Si(111) via a Si-C covalent bond, induced by exposure to UV light irradiation or ozone, were investigated using attenuated total reflectance Fourier transform infrared spectroscopy. Exposure to both ozone and UV light resulted...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 20(2004), 4 vom: 17. Feb., Seite 1207-12
1. Verfasser: Uosaki, Kohei (VerfasserIn)
Weitere Verfasser: Quayum, M Emran, Nihonyanagi, Satoshi, Kondo, Toshihiro
Format: Aufsatz
Sprache:English
Veröffentlicht: 2004
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article