Metallic contact formation for molecular electronics interactions between vapor-deposited metals and self-assembled monolayers of conjugated mono- and dithiols

Metallic contact formation for molecular electronics : interactions between vapor-deposited metals and self-assembled monolayers of conjugated mono- and dithiols

We present grazing-incidence Fourier transform infrared and AFM data of Au, Al, and Ti vapor-deposited onto self-assembled monolayers (SAMs) of conjugated mono- and dithiols. SAMs of 4,4'''-dimercapto-p-quaterphenyl, 4,4"-dimercapto-p-terphenyl, and 4,4'-dimercapto-p-bipheny...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 20(2004), 5 vom: 02. März, Seite 1539-42
1. Verfasser: de Boer, Bert (VerfasserIn)
Weitere Verfasser: Frank, Martin M, Chabal, Yves J, Jiang, Weirong, Garfunkel, Eric, Bao, Zhenan
Format: Aufsatz
Sprache:English
Veröffentlicht: 2004
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Letter
Beschreibung
Zusammenfassung:We present grazing-incidence Fourier transform infrared and AFM data of Au, Al, and Ti vapor-deposited onto self-assembled monolayers (SAMs) of conjugated mono- and dithiols. SAMs of 4,4'''-dimercapto-p-quaterphenyl, 4,4"-dimercapto-p-terphenyl, and 4,4'-dimercapto-p-biphenyl have reactive thiols at the SAM/vacuum interface that interact with vapor-deposited Au or Al atoms, preventing metal penetration. Conjugated monothiols lack such metal blocking groups, and metals (Au, Al) can penetrate into their SAMs. Vapor deposition of Ti onto conjugated mono- and dithiol SAMs and onto hexadecanethiol SAMs destroys the monolayers
Beschreibung:Date Completed 29.12.2005
Date Revised 26.10.2019
published: Print
Citation Status PubMed-not-MEDLINE
ISSN:1520-5827