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|a DE-627
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|e rakwb
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|a eng
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| 100 |
1 |
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|a McLeod, M Chandler
|e verfasserin
|4 aut
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| 245 |
1 |
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|a CO2-expanded liquid deposition of ligand-stabilized nanoparticles as uniform, wide-area nanoparticle films
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| 264 |
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|c 2005
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| 336 |
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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| 338 |
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|a Band
|b nc
|2 rdacarrier
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|a Date Completed 14.02.2006
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|a Date Revised 08.03.2005
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a Deposition of nanoparticles into uniform, wide-area thin films using CO(2) as an antisolvent is presented. Ligand-stabilized silver particles are controllably precipitated from organic solvents by pressurizing and expanding the solution with carbon dioxide. Subsequent addition of carbon dioxide as a dense supercritical fluid provides for removal of the organic solvent while avoiding the surface tensions common to evaporating solvents that are detrimental to nanoscale assemblies and structures. This brand new CO(2)-expanded liquid particle deposition technique allows for the targeted deposition of particles and results in more uniform and lower defect metal nanoparticle thin films than are provided by conventional solvent evaporation techniques
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|a Journal Article
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|a Kitchens, Christopher L
|e verfasserin
|4 aut
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1 |
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|a Roberts, Christopher B
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 21(2005), 6 vom: 15. März, Seite 2414-8
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
1 |
8 |
|g volume:21
|g year:2005
|g number:6
|g day:15
|g month:03
|g pages:2414-8
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