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231223s2005 xx ||||| 00| ||eng c |
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|a pubmed25n0513.xml
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|a (NLM)15728968
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|a DE-627
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|e rakwb
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|a eng
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1 |
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|a Fong, D D
|e verfasserin
|4 aut
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|a In situ synchrotron X-ray studies of ferroelectric thin films
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|c 2005
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|a Band
|b nc
|2 rdacarrier
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|a Date Completed 20.04.2005
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|a Date Revised 24.02.2005
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a In situ synchrotron X-ray scattering was used to observe both the growth of PbTiO3 films by metal-organic chemical vapour deposition and the behaviour of the ferroelectric phase transition as a function of film thickness. The dependences of growth mode and deposition rate on gas flows and substrate temperature were determined by homoepitaxial growth studies on thick films (>50 nm). These studies facilitated the growth of thin coherently strained PbTiO3 films on SrTiO3 (001) substrates, with thicknesses ranging from 2 to 42 nm. Experiments on the ferroelectric phase transition as a function of film thickness were carried out in these films under controlled mechanical and electrical boundary conditions
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|a Journal Article
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|a Eastman, J A
|e verfasserin
|4 aut
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|a Stephenson, G B
|e verfasserin
|4 aut
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|a Fuoss, P H
|e verfasserin
|4 aut
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|a Streiffer, S K
|e verfasserin
|4 aut
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|a Thompson, Carol
|e verfasserin
|4 aut
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| 700 |
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|a Auciello, O
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Journal of synchrotron radiation
|d 1998
|g 12(2005), Pt 2 vom: 23. März, Seite 163-7
|w (DE-627)NLM09824129X
|x 0909-0495
|7 nnns
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| 773 |
1 |
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|g volume:12
|g year:2005
|g number:Pt 2
|g day:23
|g month:03
|g pages:163-7
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|a GBV_ILN_2005
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|a AR
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|d 12
|j 2005
|e Pt 2
|b 23
|c 03
|h 163-7
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