Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography
Resist adhesion to the mold is one of the challenges for nanoimprint lithography. The main approach to overcoming it is to apply a self-assembled monolayer of an organosilane release agent to the mold surface, either in the solution phase or vapor phase. We compared the atomic force microscopy, elli...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1999. - 21(2005), 4 vom: 15. Feb., Seite 1158-61 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , , , , , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2005
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Letter |