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231223s2004 xx ||||| 00| ||eng c |
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|a (NLM)15544401
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|a DE-627
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|c DE-627
|e rakwb
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|a eng
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|a Fernandez-Martin, Cristina
|e verfasserin
|4 aut
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|a Humidity and temperature effects on CTAB-templated mesophase silicate films at the air-liquid interface
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|c 2004
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|b nc
|2 rdacarrier
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|a Date Completed 24.04.2006
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|a Date Revised 01.12.2018
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|a published: Print
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|a Citation Status MEDLINE
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|a Off-specular X-ray reflectivity measurements were carried out to follow the in situ development of surfactant-templated silica thin films at the air-water interface under conditions of controlled relative humidity and temperature, using an enclosed sample cell designed for this purpose. The results suggest a strong dependence of formation time and growth mechanism on ambient conditions. Thin films were synthesized at the air-water interface using cetyltrimethylammonium bromide (CTAB, 0.075 M) and a silica precursor, tetramethoxysilane (TMOS, 0.29-0.80 M) in an acidic medium. The studied humidity range was from 50 to 100%, the temperature was between 25 and 40 degrees C, and the TMOS/CTAB molar ratio was between 3.3 and 10.7. We observed that high humidity slows down the growth process due to lack of evaporation. However, increasing the temperature results in a decrease in the film-formation time. We proposed a formation mechanism for film growth as a consequence of phase separation, organic array assembly, and silica polymerization
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Cetrimonium Compounds
|2 NLM
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|a Membranes, Artificial
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|a Silicates
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|a Water
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|a Edler, Karen J
|e verfasserin
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|a Roser, Stephen J
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 20(2004), 24 vom: 23. Nov., Seite 10679-84
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
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|g volume:20
|g year:2004
|g number:24
|g day:23
|g month:11
|g pages:10679-84
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