Dimethyl methylphosphonate decomposition on Cu surfaces : supported Cu nanoclusters and films on TiO2(110)

The thermal decomposition of dimethyl methylphosphonate (DMMP), which is a simulant molecule for organophosphorus nerve agents, has been investigated on Cu clusters as well as on Cu films deposited on a TiO(2)(110) surface. Scanning tunneling microscopy studies were conducted to characterize the clu...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 20(2004), 22 vom: 26. Okt., Seite 9686-94
1. Verfasser: Ma, S (VerfasserIn)
Weitere Verfasser: Zhou, J, Kang, Y C, Reddic, J E, Chen, D A
Format: Aufsatz
Sprache:English
Veröffentlicht: 2004
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
LEADER 01000naa a22002652 4500
001 NLM151621810
003 DE-627
005 20231223060333.0
007 tu
008 231223s2004 xx ||||| 00| ||eng c
028 5 2 |a pubmed24n0506.xml 
035 |a (DE-627)NLM151621810 
035 |a (NLM)15491203 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Ma, S  |e verfasserin  |4 aut 
245 1 0 |a Dimethyl methylphosphonate decomposition on Cu surfaces  |b supported Cu nanoclusters and films on TiO2(110) 
264 1 |c 2004 
336 |a Text  |b txt  |2 rdacontent 
337 |a ohne Hilfsmittel zu benutzen  |b n  |2 rdamedia 
338 |a Band  |b nc  |2 rdacarrier 
500 |a Date Completed 26.05.2006 
500 |a Date Revised 19.10.2004 
500 |a published: Print 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a The thermal decomposition of dimethyl methylphosphonate (DMMP), which is a simulant molecule for organophosphorus nerve agents, has been investigated on Cu clusters as well as on Cu films deposited on a TiO(2)(110) surface. Scanning tunneling microscopy studies were conducted to characterize the cluster sizes and surface morphologies of the deposited Cu clusters and films. Temperature-programmed desorption experiments demonstrated that the surface chemistry of DMMP is not sensitive to the size of the Cu clusters over the range studied in this work. DMMP reaction on an annealed 40 monolayer Cu film resulted in the desorption of H(2), methane, methyl, formaldehyde, methanol, and molecular DMMP, and reaction on the small (4.4 +/- 0.9 nm diameter, 1.8 +/- 0.6 nm height) and large (10.7 +/- 1.9 nm diameter, 4.8 +/- 1.0 nm height) Cu clusters generated similar products. Formaldehyde and methane production is believed to occur via a methoxy intermediate on the Cu surface. These products are favored on the higher coverage Cu films that completely cover the TiO(2) surface since competing reaction pathways on TiO(2) are suppressed. X-ray photoelectron spectroscopy studies showed that DMMP begins to decompose on the Cu clusters upon adsorption at room temperature and that atomic carbon, atomic phosphorus, and PO(x) remain on the surface after DMMP decomposition 
650 4 |a Journal Article 
700 1 |a Zhou, J  |e verfasserin  |4 aut 
700 1 |a Kang, Y C  |e verfasserin  |4 aut 
700 1 |a Reddic, J E  |e verfasserin  |4 aut 
700 1 |a Chen, D A  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Langmuir : the ACS journal of surfaces and colloids  |d 1992  |g 20(2004), 22 vom: 26. Okt., Seite 9686-94  |w (DE-627)NLM098181009  |x 1520-5827  |7 nnns 
773 1 8 |g volume:20  |g year:2004  |g number:22  |g day:26  |g month:10  |g pages:9686-94 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_22 
912 |a GBV_ILN_350 
912 |a GBV_ILN_721 
951 |a AR 
952 |d 20  |j 2004  |e 22  |b 26  |c 10  |h 9686-94