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231223s2004 xx ||||| 00| ||eng c |
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|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a Owens, Thomas M
|e verfasserin
|4 aut
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| 245 |
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|a Oxidation of alkylsilane-based monolayers on gold
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| 264 |
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|c 2004
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| 336 |
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|a Text
|b txt
|2 rdacontent
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| 337 |
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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| 338 |
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|a Band
|b nc
|2 rdacarrier
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| 500 |
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|a Date Completed 26.05.2006
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|a Date Revised 19.10.2004
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a The oxidation of alkylsilane monolayers on Au has been studied by X-ray photoelectron spectroscopy, reflection-absorption infrared spectroscopy, contact-angle measurements, and scanning tunneling microscopy. Exposure of the monolayers at 298 K to pure O(2) or H(2)O (>5 x 10(-5) Torr and >150 000 L) does not cause oxidation. Ambient atmosphere only causes oxidation if direct sight lines are maintained to the sample. Ozone exposure results in rapid monolayer oxidation. Oxidation initially occurs only at the Si atom, resulting in formation of a cross-linked siloxane monolayer that retains alkyl surface termination. Prolonged ozone exposures result in the oxidation and subsequent loss of the alkyl chain
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| 650 |
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|a Journal Article
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| 700 |
1 |
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|a Ludwig, Bonnie J
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Schneider, Kevin S
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Fosnacht, Daniel R
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Orr, Bradford G
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Holl, Mark M Banaszak
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 20(2004), 22 vom: 26. Okt., Seite 9636-45
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
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|g volume:20
|g year:2004
|g number:22
|g day:26
|g month:10
|g pages:9636-45
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|d 20
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|h 9636-45
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