Patterning multiple aligned self-assembled monolayers using light

Copyright 2004 American Chemical Society

Bibliographische Detailangaben
Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1991. - 20(2004), 21 vom: 12. Okt., Seite 9080-8
1. Verfasser: Ryan, Declan (VerfasserIn)
Weitere Verfasser: Parviz, Babak Amir, Linder, Vincent, Semetey, Vincent, Sia, Samuel K, Su, Jing, Mrksich, Milan, Whitesides, George M
Format: Aufsatz
Sprache:English
Veröffentlicht: 2004
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, N.I.H., Extramural Research Support, Non-U.S. Gov't Research Support, U.S. Gov't, P.H.S. Membranes, Artificial Polymers Sulfhydryl Compounds Gold 7440-57-5
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520 |a This work describes a method for patterning a gold substrate with multiple, aligned self-assembled monolayers (SAMs) using light at different wavelengths. It describes the synthesis and characterization of an alkanethiolate SAM that is photosensitive to light at both 220 and 365 nm. A photomask acts as an area-selective filter for light at 220 and 365 nm, and a single set of exposures at these two wavelengths through one photomask, without steps of alignment between the exposures, can produce three aligned SAMs on one gold substrate. We demonstrate the versatility of this method of photopatterning by modifying individual aligned SAMs chemically to produce surfaces having different properties. We characterize the modified SAMs using immunolabeling, matrix-assisted laser desorption/ionization time-of-flight mass spectroscopy, and surface plasmon resonance spectroscopy. We also describe the patterning of two aligned SAMs that resist the adsorption of proteins and a third region that does not resist the adsorption of proteins. The ability to produce multiple, aligned patterns of SAMs in a single step, without alignment of photomasks in separate steps, increases the versatility of SAMs for studying a range of physical phenomena 
650 4 |a Journal Article 
650 4 |a Research Support, N.I.H., Extramural 
650 4 |a Research Support, Non-U.S. Gov't 
650 4 |a Research Support, U.S. Gov't, P.H.S. 
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650 7 |a Polymers  |2 NLM 
650 7 |a Sulfhydryl Compounds  |2 NLM 
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650 7 |a 7440-57-5  |2 NLM 
700 1 |a Parviz, Babak Amir  |e verfasserin  |4 aut 
700 1 |a Linder, Vincent  |e verfasserin  |4 aut 
700 1 |a Semetey, Vincent  |e verfasserin  |4 aut 
700 1 |a Sia, Samuel K  |e verfasserin  |4 aut 
700 1 |a Su, Jing  |e verfasserin  |4 aut 
700 1 |a Mrksich, Milan  |e verfasserin  |4 aut 
700 1 |a Whitesides, George M  |e verfasserin  |4 aut 
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